Your Fast Wafer Inspection
RSE combines the high sensitivity of an ellipsometer with the measurement speed of a reflectometer. In comparison to a laser ellipsometer it includes the spectroscopic information between 450 and 900 nm. This is important in the event that more than one parameter of the processed layer is variable like for example thickness and optical density. Basically referenced methods are more sensitive than absolute methods. Therefore, the RSE method is superior to conventional ellipsometry when very thin layers are in focus. The advantage of increased sensitivity to thin films is even more evident when compared to reflectometry.