NX-Hybrid WLI

Park NX-Hybrid WLI

Bringing White Light Interferometry into AFM for Semiconductor Metrology

The first-of-its-kind AFM with integrated, Park NX-Hybrid WLI, a white light interferometry profilometry, caters to a range of semiconductor manufacturing needs, from front-end to advanced packaging and R&D metrology. It's ideal for high-throughput, large-area measurements with the capability to zoom into nanometer-scale regions with sub-nano resolution and exceptional accuracy.

The Fully Automated Industrial AFM-ALI System

Applications

Bringing White Light Interferometry into AFM for Semiconductor Metrology

In the semiconductor industry, device packaging is critical in playing a key role in determining the performance, size, and reliability of modern devices. As manufacturers strive to meet the demands for smaller, more powerful semiconductors, they face challenges such as intricate integration of components, efficient thermal management, material compatibility, and maintaining electrical integrity at higher frequencies. Park Atomic Force Microscopy solutions address these challenges head-on. With their advanced precision and capability to analyze nanoscale structures, Park AFM tools enable manufacturers to navigate the complexities of advanced device packaging.

High Throughput Imaging

Park NX-Hybrid WLI provides high throughput imaging over a very large area with the WLI module, and nanoscale metrology with sub-angstrom height resolution over the areas of interest using AFM.

Key Features

Combination of WLI and AFM

Park NX-Hybrid WLI is the first-ever AFM with built-in WLI profilometry for semiconductor and related manufacturing quality assurance, process control for semiconductor front-end, back-end up to advanced packaging, and R&D metrology. It is for those that require high throughput measurements over a large area that can zoom down to nanometer-scale regions with sub-nano resolution and ultra-high accuracy.

Together, WLI and AFM excel in scope, resolution, and speed.

WLI: White light interferometry is an optical technique that can image a very wide area, very fast, producing high throughput measurements. AFM: Atomic force microscopy is a scanning probe technique that delivers the highest nanoscale resolution measurements even for transparent materials.

Motorized Filter Changer

Park WLI offers versatile support for both White Light Interferometry (WLI) and Phase Shift Interferometry (PSI) modes, with PSI mode enabled through a Motorized Filter Changer. This system includes automated swapping of two objective lenses via a Motorized Linear Lens Changer, providing enhanced flexibility and adaptability to various measurement requirements. The available objective lens magnifications include 2.5X, 10X, 20X, 50X, and 100X, ensuring precise and detailed imaging capabilities across a range of applications. Additionally, the automated replacement of objective lenses streamlines the measurement process, optimizing efficiency and accuracy in surface metrology tasks.

High Efficiency by Seamless Integration

Park NX-Hybrid WLI seamlessly integrates an automated industrial AFM system and a WLI profilometer, bringing significant cost savings, reduced tool footprint, and new metrology solutions compared to the previous two tool solutions.

Applications

Perfect for Diverse Applications