NX20

Park NX20

The leading nanometrology tool for failure analysis

Park NX20 is the go-to solution for failure analysis and semiconductor metrology. It offers accurate, precise, and reproducible measurements, featuring a non-contact mode for preserving tip sharpness, fast defect imaging, and a decoupled XY scanning system for 3D measurements. The low-noise Z detector ensures precise topography measurements without errors during high-speed scanning. With capabilities for surface roughness measurements, defect review imaging, high-resolution electrical scans, and sidewall measurements, Park NX20 excels in tackling intricate semiconductor challenges and large-sample research

Defect review imaging and analysis for Large Sample

Park NX20 is an advanced atomic force microscopy (AFM) system designed to expedite the defect review process by automating defect identification, scanning, and analysis. This cutting-edge system seamlessly integrates with a diverse array of optical inspection tools, markedly enhancing the efficiency of automatic defect reviews. Leveraging its distinctive True Non-Contact™ technology, Park NX20 stands out as the most accurate AFM available for surface roughness measurement in the market.

Surface roughness is one of the key applications where Park NX20 can excel and deliver accurate failure analysis and quality assurance. Park NX20 ensures high resolution of electrical scan mode with QuickStep SCM and PinPoint AFM.

Park NX20 enables the imaging of an entire wafer sample in a single operation, eliminating the need for additional processes. This capability is facilitated by Park's distinctive motorized XY sample stage and its innovative head design. The unique head design provides open-side access to both the sample and tip. Depending on the selected travel range option for the XY sample stage, the maximum sample size that can be accommodated on the stage is either 150 mm diameter x 20 mm or 200 mm diameter x 20 mm. This feature enhances the efficiency and convenience of wafer sample imaging with the Park NX20.

The NX20’s innovative architecture lets you detect the sidewall and surface of the sample and measure their angle. This gives the unit the versatility you need to do more innovative research and gain deeper insights.

Key Features

Unparalleled accuracy and high-resolution imaging with industry-leading low-noise

Park NX20 produces data you can trust, replicate, and publish at the highest nano resolution. It is equipped with the most effective low-noise Z detectors in the field, with a noise of 0.02 nm over a large bandwidth. This produces highly accurate sample topography and no edge overshoot. Just one of the many ways Park NX20 saves you time and gives you better data.

Comprehensive range of AFM modes for Diverse Large Sample Applications

Park NX20 is meticulously crafted to address the demands of diverse metrology and analysis applications for large samples. It stands out with its comprehensive range of modes, presenting an extensive toolkit for researchers across various fields. From standard imaging to electrochemical analysis, the instrument seamlessly supports a multitude of AFM modes, showcasing its adaptability to a wide array of applications. With Park NX20, researchers can confidently explore and delve into their scientific inquiries, benefiting from a versatile and reliable tool that enhances the precision and efficiency of their work.

Flexible Open-Access, Customizable for Cooperating with Various Research Environments

Park NX20 allows users to effortlessly tailor settings for their unique research environments, by offering a diverse range of options and accessories that make it seamlessly adapt to them: optimized options for thermal and chemical properties, etc.

Applications

Perfect for Diverse Applications